Daliah Saper will serve as a panelist at John Marshall Law School’s Third Annual Fashion and Design Law Symposium. Daliah joins other industry experts to speak on the “Trending Topics: An Industry Update” panel to discuss recent developments and trends in the fashion law arena. This panel will take place from 4:00p.m.-5:00p.m. on April 17th at John Marshall Law School at 315 S. Plymouth Court, Chicago, IL 60604.
